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Nanoimprint
lithography (NIL) is a new way of nanopatterning and a revolutionary
solution to nanomanufacturing. NIL patterns nanostructures
by the physical deformation of a deformable material
using a mold. NIL can have sub-5 nm resolution and 1% CD control,
and simultaneously achieve high-throughput, sub-10 nm structures
and low cost -- a feat currently impossible using other existing
lithographic methods. Prof. Chou's group began pioneering
developments as early as 1995 and has made a numerous breakthroughs
including the demonstration of sub-10 nm resolution.
Nanonex provides the complete nanonimprint lithography (NIL)
technology solutions: tools, resists, masks, and processes . Nanonex
technology is built on the pioneering, eight years worth
of multi-million-dollars research by
Professor Chou's university research group,
which has been
greatly enhanced by Nanonex's own developments, and is
being used in research and manufacturing by industry and
academia.
Nanonex products have many
unique advantages over anything on the market. For example,
Nanonex NIL machines are based on a patented technology, that does
not use solid plate(s) to press the wafer and masks.
This new technology gives not only excellent uniformity over entire
wafer in nanoscale, but also the precise alignment and extremely
fast processing time (less than 40 sec for a
thermal plastics resists). The new technology also allows a single
NIL machine to perform all forms of nanoimprinting, including thermal and
photocurable NIL and direct nanoimprinting. NIL resists require
very little pressure to press, are fast in response, and
have high pattern fidelity and excellent uniformity.
Furthermore,
Nanonex has a strong IP portfolio to support its products
and protect its customers.
Nanonex Publications:
"Current
Status of Nanonex Nanoimprint Solutions," Hua Tan, Linshu
Kong, Mingtao Li, Colby Steer and Larry Koecher, SPIE, (2004)
"Four-inch
Photo-Curable Nanoimprint Lithography Using NX-2000 Nanoimprint,"
Mingtao Li, Hua Tan, Linshu Kong, and Larry Koecher, SPIE,
(2004)
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