Welcome to Nanonex

Nanonex NIL solution offers low-cost, high-throughput, large-area patterning of 3D nanostructures with sub-10 nm resolution and accurate overlay alignment. It also includes all forms of nanoimprinting, such as thermoplastic, uv-curable, thermal curable, and direct imprinting (embossing). The Nanonex NIL solution can meet the needs of a broad spectrum of markets, such as optical devices, displays, data storage, biotech, semiconductor ICs, chemical synthesis, and advanced materials.

Why Nanonex

-	Best nanoimprint solution technology
-	Versatile tools for all forms of imprinting
-	Air Cushion Press^TM for wafer-scale uniformity on non-flat substrate and high yield
-	Smart Sample Holders for substrates and masks with arbitrary shapes and sizes
-	Lamp heating for ultra-fast thermal NIL
-	Broad range of tools to choose from
-	A variety of NIL materials and processes
-	IP protections

	Nanonex has been selected again as one of Top 60 Silicon Start-Ups in 2005 – three times selected in a row
	Nanonex delivers advanced nanoimprint tool to NIST becoming the largest supplier to US national labs
	Nanonex NX-2000 tools at Sandia National Laboratories.

	Nanonex has provided 13 Nanoimprint tools, over 100 orders of resists and masks, and customer R&D developments for over 60 customers.
	Some Customer Publications.

	Nanoimprint lithography is chosen as one of 10 emerging technology that will change the world .
	Nanonex is selected one of top 60 start-ups.
	Founder, Prof. Chou, was inducted to New Jersey High Technology Hall of Fame.
	Founder, Prof. Chou, was awarded IEEE Brunetti Award for invention and development of nanoimprint lithography and other nanotechnologies and nanodevices.

	SPIE Microlithography, February 19 – 24, 2006, San Jose, CA.
	EIPBN, May 30 - June 2, 2006, Baltimore, MD.

Last Update 10/2005