Pioneer and Leader in

Nanoimprint Tools & Solutions

Since 1999 with the longest history
HomeAbout UsTechnologyProductsSupportNewsCareersOrdersIntellectual Properties & Licensing Contact Us
 
Nanonex NIL solution offers low-cost, high-throughput, large-area patterning of 3D nanostructures with sub-10 nm resolution and accurate overlay alignment. It also includes all forms of nanoimprinting, such as thermoplastic, uv-curable, thermal curable, and direct imprinting (embossing). The Nanonex NIL solution can meet the needs of a broad spectrum of markets, such as optical devices, displays, data storage, biotech, semiconductor ICs, chemical synthesis, and advanced materials.
Why Nanonex
- Best nanoimprint solution technology
- Versatile tools for all forms of imprinting
- UV or  thermal imprint or both (operating simultaneously) within a single machine
- Air Cushion PressTM for wafer-scale uniformity on non-flat substrate and high yield
- Smart Sample Holders for substrates and masks with arbitrary shapes and sizes
- Fully automated nanoimprint operation
- Radiative heating for ultra-fast thermal NIL
- Broad range of tools to choose from
- A variety of NIL materials and processes
- IP protections
Recent and Key News
* Nanonex Introduces NX-M200B System to Meet Growing Demand for Mold Duplication
* Nanonex Delivered Nanoimprint Tool NX-2600 BA to University of Pennsylvania
* Nanonex Delivered Nanoimprint Tool NX-2600 BA to Arhus University, Denmark
* Nanonex Launches NX2600 Nanoimprintor and Photolithography Aligner

*

 Nanonex Expands Operation

*

Nanonex at CNM User Meeting at Argonne National Laboratory

  *

  *

  *

  *

University of Nancy-France purchases Nanonex Advanced Nanoimprint Tool NX-2500

  *

  *

  *
*

  *
Customers

 

Nanonex has provided over 40 Nanoimprint tools, more than 100 orders of resists and masks, and customized R&D developments to over 100 customers. Click here for some of our representative customers.

Nanonex Customers' Publications
Awards
Nanonex wins NIST Advanced Technology Program (ATP) award.
Nanoimprint lithography is chosen as one of 10 emerging technology that will change the world
Nanonex is selected one of top 60 start-ups.
Founder, Prof. Chou, was inducted to New Jersey High Technology Hall of Fame.
Founder, Prof. Chou, was awarded IEEE Brunetti Award for invention and development of nanoimprint lithography and other nanotechnologies and nanodevices.
Events
Cornell NanoScale Science and Technology Facility Annual cnf_annualmeetingMeeting
Thursday, September 11, 2008
on Cornell University campus, Ithaca, NY

DISKCON USA 2008 - Presented by The International Disk Drive and Materials Association (IDEMA)

September 15 - 18, 2008

Hyatt Regency Hotel/Santa Clara Convention Center
 

 
   
Copyright 2008 Nanonex Corporation. All rights reserved. Last Update 04/2010