Pioneer and Leader in

Nanoimprint Tools & Solutions

Since 1999 with the longest history

Provider of 80% nanoimprint machines in North America

Nearly 100 tools installed in 11 countries, 4 continents

Nanonex NIL solution offers low-cost, high-throughput, large-area patterning of 3D nanostructures with sub-10 nm resolution and accurate overlay alignment. It also includes all forms of nanoimprinting, such as thermoplastic, uv-curable, thermal curable, and direct imprinting (embossing). The Nanonex NIL solution can meet the needs of a broad spectrum of markets, such as optical devices, displays, data storage, biotech, semiconductor ICs, chemical synthesis, and advanced materials.
Why Nanonex
- Best nanoimprint solution technology
- Versatile tools for all forms of imprinting
- UV or  thermal imprint or both (operating simultaneously) within a single machine
- Air Cushion PressTM for wafer-scale uniformity on non-flat substrate and high yield
- Smart Sample Holders for substrates and masks with arbitrary shapes and sizes
- Fully automated nanoimprint operation
- Radiative heating for ultra-fast thermal NIL
- Broad range of tools to choose from
- A variety of NIL materials and processes
- IP protections
Recent and Key News
* Nanonex Launches Advanced 12" Nanoimprint Tool NX-2012
* Nanonex Forms Strategic Partnership With InterLitho To Bring World's Leading Interference Lithography Nanopatterning Systems To The North American Market
* Nanonex Delivers Advanced 8" Nanoimprint Tool NX-2608BA To University of Massachusetts Amherst
* East China University of Science and Technology purchases Nanonex Advanced Nanoimprint Tool NX-B200
* University of Massachusetts Amherst Purchases Nanonex Advanced 8" Nanoimprint Tool NX-2608BA
* University of Houston purchases Nanonex Advanced Nanoimprint Tool NX-2000
* Boston University purchases Nanonex Versatile Nanoimprint Tool NX-B200
* Nanonex Announces the Shipment and Installation of an Innovative Nanoimprint Lithography System for Fully Automated Manufacturing
* Founder Prof. Stephen Chou, will give tutorial on nanoimprint at IEEE Nano 2013
* Nanonex Delivers Nanoimprint Tool NX-B200 to Swinburne University of Technology, Australia
* Nanonex Introduces NX-M200B System to Meet Growing Demand for Mold Duplication
* Nanonex Delivers Nanoimprint Tool NX-2600 BA to University of Pennsylvania
* Nanonex Delivers Nanoimprint Tool NX-2600 BA to Arhus University, Denmark
* Nanonex Launches NX2600 Nanoimprintor and Photolithography Aligner


Nanonex has provided nearly 100 Nanoimprint tools, more than 400 orders of resists and masks, and customized R&D developments to over 150 customers. Click here for some of our representative customers.

Nanonex has been nominated for the 2012 Best of Business Award.
Nanonex wins NIST Advanced Technology Program (ATP) award.
Nanoimprint lithography is chosen as one of 10 emerging technology that will change the world
Nanonex is selected one of top 60 start-ups.
Founder, Prof. Chou was inducted to New Jersey High Technology Hall of Fame.
Founder, Prof. Chou, was awarded IEEE Brunetti Award for invention and development of nanoimprint lithography and other nanotechnologies and nanodevices.
Nanonex at 59th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication May 26 – May 29, 2015, San Diego, CA

Copyright 2008 Nanonex Corporation. All rights reserved. Last Update 03/2015