Nanonex NIL solution offers low-cost, high-throughput, large-area patterning of 3D nanostructures with sub-10 nm resolution and accurate overlay alignment. It also includes all forms of nanoimprinting, such as thermoplastic, uv-curable, thermal curable, and direct imprinting (embossing). The Nanonex NIL solution can meet the needs of a broad spectrum of markets, such as optical devices, displays, data storage, biotech, semiconductor ICs, chemical synthesis, and advanced materials.
Why Nanonex
- Best nanoimprint solution technology
- Versatile tools for all forms of imprinting
- UV or  thermal imprint or both (operating simultaneously) within a single machine
- Air Cushion PressTM for wafer-scale uniformity on non-flat substrate and high yield
- Smart Sample Holders for substrates and masks with arbitrary shapes and sizes
- Fully automated nanoimprint operation
- Radiative heating for ultra-fast thermal NIL
- Broad range of tools to choose from
- A variety of NIL materials and processes
- IP protections
Recent and Key News
Nanonex wins NIST Advanced Technology Program (ATP) award.
Nanonex is sponsoring 51st International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication (EIPBN '07), May 29 - June 2, 2007, Dever, CO, and 6th International Conference on Nanoimprint and Nanoprint Technology (NNT'07), October 10 - 12, 2007, Paris, France.
Nanonex delivers advanced nanoimprint tool to University of Central Florida.
Nanonex delivers new compact advanced nanoimprint tool to Los Alamos National Laboratories.

Nanonex delivers advanced nanoimprint tool to Unversity of California, Davis.

Nanonex receives the first European order for the ULTRA-100, a new integrated cleaner and molecular vapor coater from LAAS-CNRS, France.

Nanonex delivers advanced nanoimprint tool to Forschungszentrum Jülich GmbH, Germany.

Nanonex receives first order for the ULTRA-100,  a new integrated cleaner and molecular vapor coater unit from Sandia National Laboratories in Livermore, California.

Nanonex delivers advanced nanoimprint tool to NIST becoming the largest supplier to US national labs.
Nanonex NX-2000 tool at Sandia National Laboratories.
Customers
Nanonex has provided over 20 Nanoimprint tools, more than 100 orders of resists and masks, and customized R&D developments to over 100 customers. Click here for some of our representative customers.
   
Awards
Nanonex wins NIST Advanced Technology Program (ATP) award.
Nanoimprint lithography is chosen as one of 10 emerging technology that will change the world .
Nanonex is selected one of top 60 start-ups.
Founder, Prof. Chou, was inducted to New Jersey High Technology Hall of Fame.
Founder, Prof. Chou, was awarded IEEE Brunetti Award for invention and development of nanoimprint lithography and other nanotechnologies and nanodevices.
Events
6th International Conference on Nanoimprint and Nanoprint Technology (NNT'07), October 10 - 12, 2007, Paris, France
51st International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication (EIPBN '07), May 29 - June 2, 2007, Dever, CO

5th International Conference on Nanoimprint and Nanoprint Technology (NNT'06), November 15 - 17, 2006, San Francisco, CA

MRS Conference, November 27 - December 1, Boston, MA
   
Copyright 2003 Nanonex Corporation. All rights reserved. Last Update 03/2007