Nanonex NIL
solution offers low-cost, high-throughput, large-area patterning of 3D
nanostructures with sub-10 nm resolution and accurate overlay alignment. It
also includes all forms of nanoimprinting, such as thermoplastic, uv-curable,
thermal curable, and direct imprinting (embossing). The Nanonex NIL solution
can meet the needs of a broad spectrum of markets, such as optical devices,
displays, data storage, biotech, semiconductor ICs, chemical synthesis, and
advanced materials.
Why
Nanonex
-
Best nanoimprint solution technology
-
Versatile tools for all forms of imprinting
-
UV or
thermal imprint or both (operating
simultaneously) within a single machine
-
Air Cushion PressTM
for wafer-scale uniformity on non-flat
substrate and high yield
-
Smart Sample Holders for substrates and masks with
arbitrary shapes and sizes
Nanonex
has provided over 20 Nanoimprint
tools, more than 100
orders of resists and masks,
and customized R&D developments
to over 100 customers.
Click here for some of
our representative
customers.
